| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_064c032c5850cf4b1f84ae03264ff794 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-22 |
| filingDate |
2015-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa291ea6c334c1ad30d619491f71316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b9508ae12a146ead77d3941b2277305
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87d8c74e190fac849210e7a6abd0f7a2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_684a4efc437abb05a9f61b5f524f4d98
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ddf8d3b67ac2ae710802a98244fbcb5b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a10f4e90ff4b75771d40984a0f7efb2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e975df9ca9def33a40d84ed8467f29bb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7445795d079f4ff4f81d772cabfbc102 |
| publicationDate |
2017-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-3230294-A1 |
| titleOfInvention |
Organometallic solution based high resolution patterning compositions and corresponding methods |
| abstract |
Organometallic radiation resist compositions are described based on tin ions with alkyl ligands. Some of the compositions have branched alkyl ligands to provide for improved patterning contrast while maintaining a high degree of solution stability. Blends of compounds with distinct alkyl ligands can provide further improvement in the patterning. High resolution patterning with a half-pitch of no more than 25 nm can be achieved with a line width roughness of no more than about 4.5 nm. Synthesis techniques have been developed that allow for the formation of alkyl tin oxide hydroxide compositions with very low metal contamination. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3435159-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3791231-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11314168-B2 |
| priorityDate |
2014-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |