abstract |
The present invention relates to a device for Surface treatment of a substrate surface (10) of a substrate (1) with: - A process chamber for receiving the substrate (1) and - Means for amorphizing the substrate surface (1o) to form an amorphous layer (2, 2 ', 2 ") on the substrate surface (1o) with a thickness d> 0nm of the amorphous layer (2, 2', 2"). |