| abstract |
The present invention relates to a novel diblock copolymer comprising a repeat unit (1) and a repeat unit (2), where R 1 is hydrogen or C 1 -C 4 alkyl, R 2 is selected from a group chosen from hydrogen, C 1 -C 4 alkyl, C 1 -C 4 alkoxy and halide, R 3 is selected from a group chosen from hydrogen, C 1 -C 4 alkyl and C 1 -C 4 fluoroalkyl, and R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 , and R 12 are independently chosen from a C 1 -C 4 alkyl and n= 1-6. The invention also relates to a novel composition comprising the novel polymer and a solvent. The invention further relates to a process utilizing the novel composition for affecting directed self-assembly of the block copolymer. |