http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3183742-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51d028c578ae85cb937b5b34a5129fbc |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31764 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0453 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0435 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3174 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31769 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-30438 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31762 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-30422 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3177 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3026 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2014-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db8d6db9993cc08c4b5cef29be104ffc |
| publicationDate | 2017-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-3183742-A1 |
| titleOfInvention | Corner rounding correction for electron beam (ebeam) direct write system |
| abstract | Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction, each of the openings of the first column of openings having dog-eared corners. The BAA also includes a second column of openings along the first direction and staggered from the first column of openings, each of the openings of the second column of openings having dog-eared corners. The first and second columns of openings together form an array having a pitch in the first direction. A scan direction of the BAA is along a second direction, orthogonal to the first direction. The pitch of the array corresponds to half of a minimal pitch layout of a target pattern of lines for orientation parallel with the second direction. |
| priorityDate | 2014-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 66.