| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e0bf0928b608797b70bbc2b91c7e52e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate |
2015-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1806cc0b3435d390d4359f3196a79099
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7b00f2a0853b2be512f3fede3430d16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6bc307fb60236904b732d210fba663dc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ee5b8569dd2e22438b2897404692b0c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f86cda8eecb4d2454a809da4c6cc52e0 |
| publicationDate |
2017-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-3180406-A1 |
| titleOfInvention |
Chemical-mechanical polishing composition comprising organic/inorganic composite particles |
| abstract |
Described are a chemical-mechanical polishing (CMP) composition comprising abrasive particles in the form of organic/inorganic composite particles as well as the use of said composite particles as abrasive particles in a CMP composition and processes for the manufacture of a semiconductor device comprising chemical mechanical polishing of a substrate in the presence said CMP composition. |
| priorityDate |
2014-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |