| abstract |
Infrared reflecting film (100) includes, on a transparent film substrate (10), a metal oxide layer (21), an infrared reflecting layer (23) mainly made of silver, and a light absorptive metal layer (25), in this order. No metal layer is disposed between the transparent film substrate (10) and the infrared reflecting layer (23). The transparent film substrate (10) preferably includes a cured resin layer (12) on the surface at the side where the metal oxide layer (21) is formed. The metal oxide layer (21) is preferably formed of a composite metal oxide including zinc oxide and tin oxide. The light absorptive metal layer (23) has a thickness of 2 nm to 10 nm and includes at least one selected from the group consisting of nickel, chromium, niobium, tantalum, and titanium. |