| abstract |
Infrared reflecting substrate (100) includes, on a transparent film base (10), an infrared reflecting layer (23) mainly made of silver and a light absorptive metal layer (25) in this order. The light absorptive metal layer (25) has a thickness of 15 nm or less, and a transparent protective layer (30) has a thickness of 10 nm to 120 nm. The distance between the light absorptive metal layer (25) and the transparent protective layer (30) is 25 nm or less. The infrared reflecting substrate having low visible light reflectance, excellent visibility and excellent productivity is provided by the present invention. |