| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c8401bd1a86a10d5508942a53475fc38 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1675
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1682
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1633 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-16 |
| filingDate |
2015-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01c92350263ced2892b6ded02aed2340
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a2bee642d9178d530a3abd654a5abd9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_187a7595f5d0ee581be64beb58984466
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc4303ed9ea0ba6f60908598104e14de
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37ff8d3b276c4748af3c7b64d90f30ed |
| publicationDate |
2017-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-3134562-A1 |
| titleOfInvention |
Iron boron alloy coatings and a process for their preparation |
| abstract |
An aqueous plating bath for the electroless deposition of iron boron alloy coatings, characterized in that it comprises at least one iron ion source, at least one boron based reducing agent, at least one complexing agent, at least one pH buffer and at least one base wherein its pH value is 11 or higher and the molar ratio of the boron based reducing agents in relation to the iron ions in the aqueous plating bath is at least 6:1. Also, a process for the use of said aqueous plating bath is disclosed. The aqueous plating bath according to the invention shows good stability and plating rate and yields glossy and homogeneous iron boron alloy coatings on various substrates. It is an advantage of the plating bath that it does not require any sacrificial anodes. |
| priorityDate |
2014-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |