http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3011606-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0749dd1196065a3202ccc2fbf41894cd |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-0075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-0095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-24 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-22 |
| filingDate | 2014-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c6253c5fd40f90c1862fb2526be0418 |
| publicationDate | 2016-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-3011606-A1 |
| titleOfInvention | Stopping an etch in a planar layer after etching a 3d structure |
| abstract | A method of etching including providing a plurality of nanostructures extending away from a support, the support comprising a dielectric layer located between the plurality of nanowires, forming a patterned mask over a first portion of the plurality of nanostructures, such that a second portion of the plurality of nanostructures are exposed and are not located under the patterned mask, etching the second portion of the plurality of nanostructures to remove at least a portion of the patterned mask and the second portion of the plurality of nanostructures, monitoring at least one gaseous byproduct of the etching of the plurality of nanostructures during the etching of the plurality of nanostructures and stopping the etching on detecting that the dielectric layer is substantially removed. |
| priorityDate | 2013-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.