Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31598 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2483-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2367-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2365-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K50-841 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2475-04 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-0423 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-048 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-10 |
filingDate |
2013-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a032af06833e18b9013ce9f8a86cf6ed http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b4a8bff86fbf2f5c0b702f18ebde67b |
publicationDate |
2015-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-2944460-A1 |
titleOfInvention |
Gas barrier film |
abstract |
[Problem] The present invention aims to provide gas barrier film that has high gas barrier properties and high flex resistance. [Solution] The gas barrier film according to the invention includes a polymer base having an inorganic layer [A] and a silicon compound layer [B] stacked in this order at least on one side of the polymer base, the inorganic layer [A] containing a zinc compound and silicon oxide, the silicon compound layer [B] containing silicon oxynitride, and the inorganic layer [A] and the silicon compound layer [B] being in contact with each other. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018154012-A |
priorityDate |
2013-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |