Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a188d15e53f61fc61b985decfe6ec8cc |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M10-0525 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E60-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24479 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02019 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-0402 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1607 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1635 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1689 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-0492 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1605 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-386 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-134 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-1395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-02 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08 |
filingDate |
2013-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_629c74f3e578c1b503ac2ea30148c6a2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0c42558f6415afa5608c9fde979db67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_954b1b0b976380781374dada4decc4f1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e168de23c9780605f774461ee907f49 |
publicationDate |
2015-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-2828417-A2 |
titleOfInvention |
Etched silicon structures, method of forming etched silicon structures and uses thereof |
abstract |
A method of etching silicon of a material comprising silicon, the method comprising the steps of partially covering a silicon surface of the material comprising silicon with an elemental metal and then carrying out a metal-assisted chemical etching of the silicon by exposing the partially covered silicon surface to an etching composition, wherein at least some of the elemental metal for the metal-assisted chemical etching is formed by either: (a) exposing the silicon surface to a composition comprising metal ions, wherein the elemental metal forms by reduction of the metal ions and wherein the composition comprising metal ions is substantially free of HF, or (b) depositing the elemental metal directly onto the silicon surface. |
priorityDate |
2012-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |