http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2804918-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d4ada69388e0a1b68daaf536597c732 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02318 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-14 |
| filingDate | 2013-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7ea5d2be89079f276f69f8b80c1f075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e9fb5e52aaa7499dadc7c009304e9a2 |
| publicationDate | 2014-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-2804918-A1 |
| titleOfInvention | Silicon-rich antireflective coating materials and method of making same |
| abstract | An antireflective coating (ARC) formulation for use in photolithography is provided that comprises silicon-rich polysilanesiloxane resins dispersed in a solvent, as well as a substrate having a surface coated with the ARC formulation and a method of applying the ARC formulation to said surface to form an ARC layer. The polysilanesiloxane resins comprise a first component defined by structural units of (R') 2 SiO 2 ; a second component defined by structural units of (R")SiO 3 and a third component defined by structural units of (R"') q+2 Si 2 O 4-q . In these polysilanesiloxane resins, the R', R", and R'" are independently selected to be hydrocarbon or hydrogen (H) groups; and the subscript q is 1 or 2. Alternatively, the R', R", and R'" are independently selected as methyl (Me) or hydrogen (H) groups. Typically, the first component is present in a molar ratio x, the second component is present in molar ratio y, and the third component is present in a molar ratio z, such that (x + y + z) = 1, x < y, and x < z. The polysilanesiloxane resin has a silicon content that is greater than or equal to about 42 wt. %. |
| priorityDate | 2012-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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