http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2757953-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_966a6c1f382ec9bcb5e3839dfd73e5b8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3244ba8390b1f290f4ba36389c82488b
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B5-157
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B5-150022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B5-150419
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B5-150282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D67-0034
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B5-150519
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B5-150358
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B44C1-227
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D67-0058
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B5-1411
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61B5-151
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61B5-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01L3-00
filingDate 2012-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6efc1b6f20f9e1ce3bddc36fcc98042c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c3d09c98327c8a5a9fda8345a00de13
publicationDate 2014-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-2757953-A1
titleOfInvention Method for the mask-etching of a piercing element
abstract The application relates to a method for the mask-etching of a piercing element (14) which has an elongate shaft (16), a distally protruding tip (18), a proximal holding part (20), and a laterally open collecting channel (22) that collects bodily fluid and extends along the shaft (16) as far as the area of the tip (18). For this purpose, a double-sided etching mask (10) is applied to the two sides of a substrate (12) and, under the action of an etching agent, the piercing element (14) is formed as a part made by chemical blanking, wherein a channel side (28) of the etching mask (10) is provided with a channel etching slit (38) for unilateral etching of the collecting channel (22). It is proposed that a proximal and/or distal end portion (40, 60) of the channel etching slit (38) is designed tapering towards the end of the slit.
priorityDate 2011-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID226395793
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID4911

Total number of triples: 27.