http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2702014-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a8a9982b1666c54b5bf02d6c944891e4 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-87 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-88 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-85 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B37-01413 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B37-01807 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B37-014 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B37-018 |
| filingDate | 2012-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4bf72ea03b807037e946cec575c02301 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24fa83830798542406ad2dd41e85f944 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_037761138b840c3cdfcb0d499dff64b5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e2ca165c35e3c252de2f5ba72f54ee8 |
| publicationDate | 2014-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-2702014-A1 |
| titleOfInvention | Methods and apparatuses for reducing gelation of glass precursor materials during vaporization |
| abstract | Methods and apparatuses for vaporizing liquid precursor material for use in a vapor deposition process are disclosed. The method for vaporizing liquid precursor material includes introducing a flow of liquid precursor material into an expansion chamber and directing the flow of liquid precursor material towards a wall of the chamber. The wall of the chamber is heated to a temperature sufficient to vaporize a first portion of the flow of liquid precursor material while a second portion of the flow of liquid precursor material remains in a liquid state and a third portion of the liquid precursor material is formed into gel. The expansion chamber is continuously drained as the flow of liquid precursor material is introduced into the expansion chamber. The chamber is heated to a temperature to produce a sufficient amount of the second portion of the liquid precursor material to flush the gel from the chamber. |
| priorityDate | 2011-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.