| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d9f3ca41550d315642580237250c5b0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2201-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2201-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-262
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-24 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41N3-036
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-1008 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41N3-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41C1-10 |
| filingDate |
2012-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50ec8e73cd99cfebb6f578a2b8325b96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12d760fa5f4dec7c0538fdee7e057a56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09384ac152bd572bf852fe03587aed49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99d1ab0cde715ac848fe0717a9af4898 |
| publicationDate |
2014-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2699426-A1 |
| titleOfInvention |
Aluminum substrates and lithographic printing plate precursors |
| abstract |
Electrochemically grained and anodized aluminum supports are treated with a post-treatment coating solution containing a polymer derived at least in part from vinyl phosphonic acid and phosphoric acid. This post-treated support is useful as substrates in the preparation of lithographic printing plate precursors. The post-treatment substrate treatment enables wide latitude in manufacturing and compatibility with silicate-free developers to achieve negligible background staining and oxide attack. |
| priorityDate |
2011-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |