| abstract |
There is provided a material, which makes it possible to form a pattern by applying a photosensitive composition to a base material and drying to form a photosensitive coating and performing exposure and development, and a method for forming the pattern. A photosensitive composition comprising water-soluble organic particles, and a solvent, wherein the solvent is a poor solvent for the water-soluble organic particles. Preferably, the photosensitive wherein the water-soluble organic particles include a polymer which contains a unit structure (A) for forming organic particles, a unit structure (B) for forming interparticle crosslinkage, and a unit structure (C) for imparting dispersibility, and the photosensitive composition further comprises a photoacid generator. In addition, the photosensitive wherein the water-soluble organic particles include a polymer which contains the unit structure (A) for forming organic particles, the unit structure (B) for forming interparticle crosslinkage, the unit structure (C) for imparting dispersibility, and a unit structure (D) having a photoacid generating group. A pattern forming method comprising: a step of applying the photosensitive composition to a base material and drying to form a photosensitive coating; a step of exposing the coating to light through a mask; and a step of performing developing using a developer. |