| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F257-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2037 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-24 |
| filingDate |
2011-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c176f1fdce4113014561a5a266f36da
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b2cbaa9fef0bd8ec66e14cb425cfb01 |
| publicationDate |
2013-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2666057-A1 |
| titleOfInvention |
Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound |
| abstract |
A chemical amplification resist composition contains: (A) a polymer compound having a structure where a hydrogen atom of a phenolic hydroxyl group is replaced by a group having a non-acid-decomposable polycyclic alicyclic hydrocarbon structure; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation. |
| priorityDate |
2011-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |