http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2642341-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5227534d5452763715e3b63f856057cf |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0149 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-48721 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00087 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y15-00 |
| filingDate | 2012-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-2642341-A2 |
| titleOfInvention | Manufacturing method of an apparatus for the processing of single molecules |
| abstract | The invention relates to a method for manufacturing an apparatus for the processing of single molecules. According to this method, a self-assembling resist (155) is deposited on a processing layer (110, PL) and allowed to self-assemble into a pattern of two phases (155a, 155b). One of these phases (155a) is then selectively removed, and at least one aperture is generated in the processing layer (110, PL) through the mask of the remaining resist (155b). Thus apertures of small size can readily be produced that allow for the processing of single molecules (M), for example in DNA sequencing. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105531360-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105531360-A |
| priorityDate | 2012-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.