http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2633559-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_08eb28b3968bddbd89b05ad4d10302cd |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-022425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-022441 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0224 |
| filingDate | 2011-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4406fa300f0f6fd82be5a5703839f446 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9281e3373006056c6c945647825edaca |
| publicationDate | 2013-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-2633559-A2 |
| titleOfInvention | A method for producing a back-contact back-junction silicon solar cell |
| abstract | A device, and a method and apparatus for producing the device, having a surface layer (4, 5) of a selected material in a predetermined pattern on a surface of a substrate (1). The substrate has a groove (7) or a ridge arranged in said substrate surface, said groove (7) or ridge having a bottom (3) or top (2) face, respectively, and at least one side face (8) sloping with respect to said bottom face (3) or said top face (2). The surface layer (4, 5) is deposited on a part of said substrate (1) comprising said groove (7) or ridge by vacuum chamber sputtering of said selected material from a sputtering source (30) whilst moving said substrate (1) past said sputtering source (30) in a direction substantially perpendicular to a direction (40) of a main lobe (20) of sputtering from said sputtering source (30) and with a normal to the substrate surface (1) substantially in in a predefined angle with said main lobe (20) direction. By uniformly etching away surface layer material deposited on said substrate by said sputtering until at least a substantial part of said side face (8) is free of said surface layer (5), the predetermined pattern becomes defined substantially by the bottom face (3) of the groove or by the top face (2) of the ridge. |
| priorityDate | 2010-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.