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filingDate 2011-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8bbd95fdce502f19fb814cee624a2e72
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publicationDate 2013-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-2605069-A1
titleOfInvention Rinse liquid for lithography and method for forming pattern using same
abstract The present invention provides a rinse solution for lithography and a pattern formation method using the solution. They can improve prevention of both the pattern collapse and the melting at the same time. The solution contains water and a particular nitrogen-containing compound having an organic group, such as, alkyl amine or the like. The rinse solution may further contain a nonionic surfactant, if necessary.
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