| abstract |
To provide a photocurable composition with which a cured product excellent in the environmental properties and release property can be formed and which exhibits excellent compatibility between a fluorinated surfactant and other components, and a process for producing a molded product having on its surface a fine pattern having a reverse pattern of a mold precisely transferred, and having a uniform composition of the surface. n A photocurable composition for imprint, containing, as the main component, a compound having at least one (meth)acryloyloxy group, which comprises the following polymer (D). A polymer (D) containing from 20 to 45 mass% of units of CH 2 =C(R 11 )-C(O)O-Q-R f , from 20 to 65 mass% of units of CH 2 =C(R 21 )-C(O)O-(CH 2 CH(R 22 )O) n -H (number average molecular weight of at most 350) and from 5 to 40 mass% of units of CH 2 =C(R 31 )-C(O)O-R 32 , having a mass average molecular weight of from 1,000 to 5,000. R 11 , R 21 , R 31 : a hydrogen atom or a methyl group, Q: a bivalent linking group or the like, R f : a C 1-6 polyfluoroalkyl group or the like, R 22 : a hydrogen atom or the like, n: 3 to 6, and R 32 : a C 2-15 aliphatic hydrocarbon group. |