Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_063a1b324005ddc15e16e7529c6258c4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K85-624 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K85-791 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-1804 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-12 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-18 |
filingDate |
2010-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a999c5bfaf12a15fe9b63118f3475c48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8008804d2a0299a9328128f86e7dc097 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36103acb815c37d79b0e53d747080151 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e3a8c502dde5b90b8072d1b618e87aa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf16474d49ae0e6f9ac85741f7dddc65 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0729be615f9fde3c1dd32d9f7faa36dd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a3f4052121f9f64a046f5b03a2c692b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd3bbef8c189a657628de17091fa4177 |
publicationDate |
2012-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-2502926-A1 |
titleOfInvention |
Compound |
abstract |
A problem of the present invention is to prevent a base layer beneath the layer to be irradiated with light from deterioration in property and a functional thin film from deterioration in property as the fine patterning of a functional film is performed with light irradiation. Means for solving the problem is a compound obtained by dimerizing with light irradiation a compound (A) containing a group that has photosensitivity and can be photodimerized and a group having lyophilicity and a compound (B) containing a group that has photosensitivity and can be photodimerized and a group having liquid-repellency. |
priorityDate |
2009-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |