| abstract |
The invention describes a sputtering target comprising a ceramic body having tin oxide as a major constituent and between 0.5 and 15 wt% of at least two other oxides, one of which being antimony oxide, the target having a density of at least 90%, and preferably at least 95%, of the theoretical density (TD) and an electrical resistivity of less than 50 Ohm. cm, and the target having a planar or rotary configuration with a sputtering area of at least 10 cm 2 , and preferably at least 20 cm 2 . Also described is a process for manufacturing this sputtering target according comprising the steps of: - providing for a slurry comprising tin oxide and said at least two other oxides, - shaping of a green body from said slurry, and drying said green body, - firing of said green body at a temperature between 1050 and 1250° C, thereby obtaining a pre- shaped target, and - grinding of said pre-shaped target to its final dimensions. |