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publicationNumber EP-2487765-A1
titleOfInvention Group iii nitride semiconductor laser element and method for preparing group iii nitride semiconductor laser element
abstract A III-nitride semiconductor laser device having an improved resistance to COD is provided. The III-nitride semiconductor laser device 17 includes a laser waveguide extending in the direction of intersection of the semipolar surface 17a with the m-n plane. The first and second end faces 26, 28 are located at the ends of the laser waveguide, respectively. The first and second end faces 26, 28 intersect with the m-n plane (or a-n plane). The c+ vector forms an angle with a waveguide vector WV. The waveguide vector WV indicates the direction from the second end face 28 to the first and face 26. The thickness of the first dielectric multilayer film 43a (C+ side) on the first end 26 is smaller than that the second dielectric multilayer film 43b (C- side) on the second end 28.
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