http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2487135-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38cabe784f1ef1b63abdcfd77e5764e2 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E60-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M10-0525 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-131 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B65D81-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-485 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-113 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-62 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-113 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M4-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B65D81-24 |
| filingDate | 2010-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_274bcaa87b2f76fcbbb3f00d76bfb8f7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e63d7174dfe6f631639ba397277ee175 |
| publicationDate | 2012-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-2487135-A1 |
| titleOfInvention | SiOx, AND VAPOR DEPOSITION MATERIAL FOR BARRIER FILM AND NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM-ION SECONDARY BATTERY EACH USING THE SAME |
| abstract | Provided is SiO x , wherein the amount of generated H 2 O gas detected in a temperature range of 200 to 800°C in a temperature-programmed desorption gas analysis is 680 ppm or less. The amount of the generated H 2 O is desirably 420 ppm or less. In addition, in a graph obtained by X-ray diffraction, the peak intensity P1 at a Si peak point exhibited near 2θ = 28° and the base intensity P2 at a peak point interpolated from the gradient of average intensities in the fore and aft positions near the peak point desirably satisfy (P1-P2)/P2≤0.2. This SiO x is used as a vapor deposition material, whereby the generation of splashing is suppressed in forming a film, and a vapor-deposited film having excellent gas barrier properties can be formed. In addition, this SiO x is used as a negative electrode active material, whereby high initial efficiency of a lithium-ion secondary battery can be maintained. |
| priorityDate | 2009-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.