| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_515262dca048e434990a1670088a10fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730848fc69ca7afca2b3c3e10b6cfd92 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-483
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02326 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-62218
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1208
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02326
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02222
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
| filingDate |
2010-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04250f455d9c453d1427f0d8acf1cfd4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8f34c0529edf78913b5951ec484b76a |
| publicationDate |
2012-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2475001-A1 |
| titleOfInvention |
Method for producing siliceous film and polysilazane coating treatment liquid used therefor |
| abstract |
The present invention provides a method for forming a siliceous film. According to the method, a siliceous film having a hydrophilic surface can be formed from a polysilazane compound at a low temperature. In the method, a composition containing a polysilazane compound and a silica-conversion reaction accelerator is applied on a substrate surface to form a polysilazane film, and then a polysilazane film-treatment solution is applied thereon so that the polysilazane compound can be converted into a siliceous film at 300°C or less. The polysilazane film-treatment solution contains a solvent, hydrogen peroxide and an alcohol. |
| priorityDate |
2009-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |