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publicationDate 2011-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-2389615-A1
titleOfInvention Large area, homogeneous array fabrication including substrate temperature control
abstract Improved patterning at small scale including nanoscale. A method comprising: providing at least one cantilever comprising at least one tip thereon, and a material deposited on the tip, contacting the cantilever with a substrate so that the material is deposited from the tip onto the substrate to form a material deposit, wherein the temperature of the substrate is adapted to control a size of the material deposit. A device comprising: at least one heat sink, at least one heating or cooling stage, at least one vacuum system, wherein the device is adapted to function with a substrate to be subjected to a material deposition and to keep the substrate temperature substantially constant during deposition.
priorityDate 2009-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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