| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3d52eacd83e723ebd2ca61b598586c2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-95676
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-30148 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-956
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-001 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate |
2009-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61d1fa6bda56a92edc53899f7ea30252
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c38f26b17c0fb9ffcd197d3b9a4d1b97
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_afa17fa2831860fa9c978af5f362857a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f74d40e9d62a7e4a955273c0d1f53be3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a3e40240ef90e5ca82a7a021be109e6 |
| publicationDate |
2011-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2374148-A2 |
| titleOfInvention |
Methods and systems for detecting defects on a reticle |
| abstract |
Methods and systems for detecting defects on a reticle are provided. One method includes printing a single die reticle in first areas of a wafer using different values of a parameter of a lithography process and at least one second area using a nominal value of the parameter. The method also includes acquiring first images of the first areas and second image(s) of the at least one second area. In addition, the method includes separately comparing the first images acquired for different first areas to at least one of the second image(s). The method further includes detecting defects on the reticle based on first portions of the first images in which variations in the first images compared to the at least one second image are greater than second portions of the first images and the first portions that are common to two or more of the first images. |
| priorityDate |
2008-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |