Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1809 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F28-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-18 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38 |
filingDate |
2010-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed9e763bfda0d7a815e8950d866b17a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e502fb082947d46cdde81aa2805de59 |
publicationDate |
2011-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-2341089-A1 |
titleOfInvention |
Photosensitive compositions |
abstract |
Provided are radiation-sensitive polymers and compositions which may be used in photolithographic processes. The polymers and compositions provide enhanced sensitivity to activating radiation. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8957160-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8900792-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8907122-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11357884-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8716518-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2472323-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2631253-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015108487-A1 |
priorityDate |
2009-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |