| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F214-182
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F214-186
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2005-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_962132911cf911e4cb5af4b286a88959
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe06fbad1fd7508a680752e9e79d99c3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a39e540e419bb09c6cc76ad65e7dc9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c6c4cfe3d21feca0dfa55da5b136228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a1fe9ead439503816b839fc3b440b1a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18b2a50ff241b597584156c9fe5d6f21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5cb325f92a1858f1c565cbfc944f4a33 |
| publicationDate |
2012-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2315078-B1 |
| titleOfInvention |
Upper layer film forming composition for liquid immersion and method of forming photoresist pattern |
| priorityDate |
2004-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |