| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8fd1e4193f0f5eb58621db6ec20566a5 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2201-042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24917
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0107 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B26-001
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B3-0008 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 |
| filingDate |
2009-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44d06318e2291e339d68f3d25589b8bb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b471f8ea15da0491facace589427c33b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea223e4a1e69213764cf81432f06ffa0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db213038359fb2399ad0e595905cce0e |
| publicationDate |
2011-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2297026-A2 |
| titleOfInvention |
Low temperature amorphous silicon sacrificial layer for controlled adhesion in mems devices |
| abstract |
Methods of fabricating an electromechanical systems device that mitigate permanent adhesion, or stiction, of the moveable components of the device are provided. The methods provide an amorphous silicon sacrificial layer with improved and reproducible surface roughness. The amorphous silicon sacrificial layers further exhibit excellent adhesion to common materials used in electromechanical systems devices. |
| priorityDate |
2008-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |