Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a2bcaf91101a370a3d64e3190366357f |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-105 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45523 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-515 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-14 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-515 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-00 |
filingDate |
2009-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ddb6a064bd79e053379d521e88264ad6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5d5f137f46617363cb5ee83e949c52f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59d9673279c710d0de08a33e2d3232ab http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a33994e077b27cc31b0e70f5ddbeee5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3939ea28ee12a65b26d3fa5de7702f3e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe7dd152f03b967de6ca3ed675e899de |
publicationDate |
2011-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-2288646-A1 |
titleOfInvention |
Method for depositing a scratch protection coating on a plastic substrate |
abstract |
The invention relates to a method for depositing a transparent scratch protection coating on a plastic substrate by means of plasma-enhanced chemical vapor deposition (PECVD), wherein at least one metal organic precursor and at least one reactive gas are fed into a vacuum chamber, wherein the plasma is generated by means of a pulsed magnetron, and at least one layer having continuous or abrupt changes with regard to layer composition is deposited. |
priorityDate |
2008-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |