| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3fae82072ffc52ea15e98e2d1ecb9ed0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_37f4922dfb7777b019e504b885211b8e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_93eecaaa7fc7d6e4e24db5ad75274f7f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1601
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1605
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1603
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1824 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-02 |
| filingDate |
2009-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1276872714e17d994d83d33226c9fa43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36cab540b8b9b5f5fa492a00219e8823
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a91c4ee6ce3b0f1dc39f4e56b5b4c106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c04fcb88b13f74bf6f26f8e1bdc9cde7 |
| publicationDate |
2011-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2283171-A1 |
| titleOfInvention |
Method for selectively depositing a precious metal on a substrate by the ultrasound ablation of a mask element, and device thereof |
| abstract |
The invention relates to a method for selectively depositing a precious metal (32) on a metal substrate (10), the method sequentially comprising: a masking step, consisting of depositing a mask element (16) on one treated surface (12) of the metal substrate (10); a selective ablation step, for the selective ablation of at least one removed portion (17) of the pre-deposited mask element (16) to expose at least one deposition area (18) of said treated surface (12) of the metal substrate (10); a deposition step, for depositing the precious metal (32) on said pre-exposed deposition area (18); and characterized in that the selective ablation step involves the ultrasound wave (22) irradiation of said removed portion (17) of the mask element (16) to destroy said removed portion (17). The invention also relates to an ultrasound device (20) for implementing the selective ablation step. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021164111-A1 |
| priorityDate |
2008-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |