| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_78962922f9e21091cc20ab4a474aa3af |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-8803 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08 |
| filingDate |
2009-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_896522c0a212a226477adf69de64e517
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7bf4a3b9dc99bea353cffa16996e55b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_787402d428d564dbb574f8ba529df2fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57b0783966040503fa624580969e9b94 |
| publicationDate |
2010-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2226374-A1 |
| titleOfInvention |
Etching composition, in particular for silicon materials, method for characterizing defects of such materials and process of treating such surfaces with etching composition |
| abstract |
The present invention relates to an etching composition, in particular for silicon materials, a method for characterizing defects on surfaces of such materials and a process of treating such surfaces with the etching composition, wherein the etching composition comprises an organic oxidant dissolved in a solvent, and a de-oxidant, wherein the de-oxidant comprises HF or HBF 4 or mixtures thereof. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103988342-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013050785-A1 |
| priorityDate |
2009-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |