| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9fe42a285c4349f7f565d96917d98b67 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-49 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-06 |
| filingDate |
2008-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d931738e7d4eab06f509cfd74f8ce522
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b350298e4823cee1733e255808e69b3e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e5e9560cca3e365f9bf25f92c84bcb1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_144a8accc97aa878b050c9e848dbaa80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a004f47d8ddcddd147a6c8a3881e9182 |
| publicationDate |
2010-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2220165-A1 |
| titleOfInvention |
Siloxane polymer compositions and methods of using the same |
| abstract |
A siloxane composition and a method of producing the Same. The composition comprises a siloxane prepolymer with a backbone exhibiting a group which is capable of being deprotonated in an aqueous base solution. Further, there are reactive functional groups, which are capable of reacting during thermal or radiation initiated curing. The siloxane polymer is provided in a solvent which also contains a photo reactive compound. The composition can be used in negative tone lithographic fabrication processes where a water based developer system is applied in the development step of the lithography process. |
| priorityDate |
2007-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |