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publicationDate 2010-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-2203928-A1
titleOfInvention Double plasma ion source
abstract An ion source 100, comprising a first plasma chamber 102 including a plasma generating component 104 and a first gas inlet 122 for receiving a first gas such that said plasma generating component 104 and said first gas interact to generate a first plasma within said first plasma chamber 102, wherein said first plasma chamber 102 further defines an aperture 114 for extracting electrons from said first plasma, and a second plasma chamber 116 including a second gas inlet 118 for receiving a second gas, wherein said second plasma chamber 116 further defines an aperture 117 in substantial alignment with the aperture 112 of said first plasma chamber 102, for receiving electrons extracted therefrom, such that the electrons and the second gas interact to generate a second plasma within said second plasma chamber 116, said second plasma chamber 116 further defining an extraction aperture 120 for extracting ions from said second plasma.
priorityDate 2007-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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