| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3a347c2939ec43a4060054df1526348f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-365
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-113
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-00 |
| filingDate |
2008-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9de3d0803f43a29d0e2bb8aef800e3ee |
| publicationDate |
2010-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2197804-A1 |
| titleOfInvention |
Method of making an antireflective silica coating, resulting product, and photovoltaic device comprising same |
| abstract |
A low-index silica coating may be made by forming silica sol comprising a silane and/or a colloidal silica. The silica precursor may be deposited on a substrate (e.g., glass substrate) to form a coating layer. The coating layer may then be cured and/or fired using temperature(s) of from about 550 to 700°C. A surface treatment composition comprising an organic material comprising an alkyl chain or a fluoro-alkyl chain and at least one reactive functionality comprising silicon and/or phosphorous may be formed, deposited on the coating layer, then cured and/or fired to form an overcoat layer Preferably, the overcoat layer does not substantially affect the percent transmission or reflection of the low-index silica coating. The low-index silica based coating may be used as an antirefiective (AR) film on a front glass substrate of a photovoltaic device (e.g., solar cell) or any other suitable application in certain example instances. |
| priorityDate |
2007-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |