| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81cfb88d909c75104c0c8d61799a72b0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-423 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B32-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2008-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e51b2cf8b92e59b77666907dc70bab1e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8925e04a466b029bf2250a6a5facee36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03ffc2e8efc27f724b66610c032a369b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aeb0d4ad6ffb45a801c21421c86b4399 |
| publicationDate |
2010-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2190967-A2 |
| titleOfInvention |
Composition and method for removing ion-implanted photoresist |
| abstract |
A method and mineral acid-containing compositions for removing bulk and/or hardened photoresist material from microelectronic devices have been developed. The mineral acid-containing composition includes at least one mineral acid, at least one sulfur-containing oxidizing agent, and optionally at least one metal ion-containing catalyst. The mineral acid-containing compositions effectively remove the hardened photoresist material while not damaging the underlying silicon-containing layer(s). |
| priorityDate |
2007-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |