| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a04ec82c01a5765a0fb9c6c0d8a9abba |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-29 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-29
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-32 |
| filingDate |
2001-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59014028991acc20cb5e4a9922bd4c54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d13c2b90d09ef52897fbc9b1efea00fd |
| publicationDate |
2010-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2177948-A1 |
| titleOfInvention |
Method of Fabricating an Integrated Circuit using a Tri-Tone Attenuated Phase Shifting Mask Corrected for Proximity Effects |
| abstract |
A structure and method are provided for correcting the optical proximity effects on a tri-tone attenuated phase-shifting mask. An attenuated rim, formed by an opaque region and an attenuated phase-shifting region, can be kept at a predetermined width across the mask or for certain types of structures. Typically, the attenuated rim is made as large as possible to maximize the effect of the attenuated phase-shifting region while still preventing the printing of larger portions of the attenuated phase-shifting region during the development process. |
| priorityDate |
2000-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |