http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2155925-A1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
filingDate 2008-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_26b106bab26259be9d861e7313ecc159
publicationDate 2010-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-2155925-A1
titleOfInvention Atomic layer deposition methods, methods of forming dielectric materials, methods of forming capacitors, and methods of forming dram unit cells
abstract Some embodiments include methods of forming metal-containing oxides. The methods may utilize ALD where a substrate surface is exposed to an organometallic composition while the substrate surface is at a temperature of at least 275°C to form a metal-containing layer. The metal-containing layer may then be exposed to at least one oxidizing agent to convert the metal-containing layer to a metal-containing oxide. The ALD may occur in a reaction chamber, with the oxidizing agent and the organometallic composition being present within such chamber at substantially non-overlapping times relative to one another. The oxidizing agent may be a milder oxidizing agent than ozone. The metal-containing oxide may be utilized as a capacitor dielectric, and may be incorporated into a DRAM unit cell.
priorityDate 2007-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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