| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a2bcaf91101a370a3d64e3190366357f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A01N59-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A01N59-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0688
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01N25-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate |
2007-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2011-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90a6b2bb606f4ba9179e2cad15e244f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fbb48553b7977914267cff7401d18a58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e27d5a31102d9d2885b3a30a5b6b7692
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5d5f137f46617363cb5ee83e949c52f |
| publicationDate |
2011-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2102381-B1 |
| titleOfInvention |
Method for the production of an antimicrobial material |
| abstract |
The invention relates to an antimicrobial material and to a method for the production of an antimicrobial material which is deposited on a substrate (2), said method comprising the following steps: preparation of the substrate (2) in a vacuum working chamber (3); atomizing a biocidal metal by means of a sputtering device within the vacuum working chamber (3) in the presence of an inert gas; simultaneous introduction of a precursor which contains silicon, carbon, hydrogen, and oxygen into the vacuum working chamber (3) in such a way that the sputtered metal particles and the precursor are exposed to the action of a plasma; and depositing a material on the substrate (2) in such a way that by the plasma activation of the precursor, a matrix is formed in which clusters of sputtered metal particles are incorporated. |
| priorityDate |
2006-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |