Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2007-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2012-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9d3153646e12097cc722fa97f091a2a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f73a270ddcc3792b1bff4740b69cbe1f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5783a7a19d175409e79c32dee7015004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59224293f0057bb4dbfd15a239762891 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a39e540e419bb09c6cc76ad65e7dc9 |
publicationDate |
2012-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-2078983-B1 |
titleOfInvention |
Composition for formation of upper layer film, and method for formation of photoresist pattern |
abstract |
Disclosed is a composition for forming an upper layer film, which can form an upper layer film having a satisfactorily high receding contact angle and which can be used for forming an upper layer film on the surface of a photoresist film. The composition comprises a resin (A) which has a repeating unit represented by the general formula (1-1) and does not have any repeating unit represented by the general formula (1-2) and a resin (B) which has a repeating unit represented by the general formula (1-2) and does not have any repeating unit represented by the general formula (1-1). (1-1) (1-2) wherein R1 represents a hydrogen or the like; R2 represents a single bond or the like; and R3 represents a fluorine-substituted linear or branched alkyl group having 1 to 12 carbon atoms or the like. |
priorityDate |
2006-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |