Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
filingDate |
2007-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f73a270ddcc3792b1bff4740b69cbe1f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59224293f0057bb4dbfd15a239762891 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5783a7a19d175409e79c32dee7015004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a39e540e419bb09c6cc76ad65e7dc9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9d3153646e12097cc722fa97f091a2a |
publicationDate |
2009-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-2078983-A1 |
titleOfInvention |
Composition for formation of upper layer film, and method for formation of photoresist pattern |
abstract |
A composition for formation of upper layer film, which is used for forming an upper layer film on the surface of a photoresist film and which comprises na resin (A) having a repeating unit represented by the following general formula (1-1) and not having a repeating unit represented by the following general formula (1-2), and na resin (B) having a repeating unit represented by the following general formula (1-2) and not having a repeating unit represented by the following general formula (1-1).n [In the general formulas (1-1) and (1-2), R 1 is hydrogen or the like; R 2 is single bonds or the like; and R 3 is a fluorine-substituted, linear or branched alkyl group having 1 to 12 carbon atoms, or the like.] The composition can form an upper layer film giving a sufficiently high receded contact angle. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9261789-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9122159-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012021359-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9063425-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8241832-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8883400-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8808967-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8748080-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9274427-B2 |
priorityDate |
2006-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |