http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2067526-A1

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filingDate 2007-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96645cc1818583b6861ce7171527bb60
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publicationDate 2009-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-2067526-A1
titleOfInvention Devices and methods for radiation assisted chemical processing
abstract Disclosed is a device for performing radiation assisted chemical processing including a fluid path, defined at least in part by a first surface of a wall transparent to radiation useful for performing radiation assisted chemical processing, and a gas discharge or plasma chamber arranged for producing the radiation, wherein the chamber is defined at least in part by a second surface of the transparent wall, opposite the first. Also disclosed is a method of forming a photocatalytic reactor, the method comprising the steps of providing a fluid path having, along at least a part thereof, a non-circular cross section, the path defined at least in part by a first surface of a wall of a material transparent to a desired photocatalytic radiation; wash-coating the fluid path so as to deposit a photocatalytic material therein, wherein the step of wash-coating includes depositing the photocatalytic material on a first portion of the of non-circular cross section of the path, and not depositing the photocatalytic material on, or removing the photocatalytic material from, a second portion of the non-circular cross section of the path, the second portion including at least some of the first surface of the wall of transparent material.
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