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filingDate 2007-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2009-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-2062307-A2
titleOfInvention Method for controlled formation of the resistive switching material in a resistive switching device and devices obtained thereof
abstract The present disclosure provides a method for controlled formation of the resistive switching layer in a resistive switching device. The method comprises providing a substrate (2) comprising the bottom electrode (10), providing on the substrate a dielectric layer (4) comprising a recess (7) containing the metal for forming the resistive layer (11), providing on the substrate a dielectric layer (5) comprising an opening (8) exposing the metal of the recess, and forming the resistive layer in the recess and in the opening.
priorityDate 2006-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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