| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_045f3b29938ea388e5bd261041c30f09 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45534
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate |
2007-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4aef19d55ed1e46892543dadeb1b0e92
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d553ab6a7e02dd612ada1cd50a019e3e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f743ed000ed37ac070ebb88380630cc2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b32b6db343fc48da5a425c65d61d757c |
| publicationDate |
2009-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2049705-A2 |
| titleOfInvention |
Improved methods for atomic layer deposition |
| abstract |
Improved methods for performing atomic layer deposition (ALD) are described. These improved methods provide more complete saturation of the surface reactive sites and provides more complete monolayer surface coverage at each half-cycle of the ALD process. In one embodiment, operating parameters are fixed for a given solvent based precursor. In another embodiment, one operating parameter, e.g. chamber pressure is altered during the precursor deposition to assure full surface saturation. |
| priorityDate |
2006-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |