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publicationDate 2009-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-2040122-A3
titleOfInvention Positive resist composition and pattern-forming method using the same
abstract A positive resist composition comprises: n(A) a resin capable of increasing its solubility in an alkali developer by action of an acid and not containing a silicon atom; n(B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, n(C) a silicon atom-containing resin having at least one group selected from groups (X) to (Z), n n(X) an alkali-soluble group, n(Y) a group capable of decomposing by action of an alkali developer to increase the solubility of resin (C) in an alkali developer, n(Z) a group capable of decomposing by action of an acid to increase the solubility of resin n(C) in an alkali developer; and n(D) a solvent.
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