Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
filingDate |
2006-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b89d830ab5128f7706f85157699ac6c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_817f940401b789132740205f97c4aa0e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ddc38583dc3b6dfc1c92cfb863307e0 |
publicationDate |
2009-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-2040122-A3 |
titleOfInvention |
Positive resist composition and pattern-forming method using the same |
abstract |
A positive resist composition comprises: n(A) a resin capable of increasing its solubility in an alkali developer by action of an acid and not containing a silicon atom; n(B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, n(C) a silicon atom-containing resin having at least one group selected from groups (X) to (Z), n n(X) an alkali-soluble group, n(Y) a group capable of decomposing by action of an alkali developer to increase the solubility of resin (C) in an alkali developer, n(Z) a group capable of decomposing by action of an acid to increase the solubility of resin n(C) in an alkali developer; and n(D) a solvent. |
priorityDate |
2005-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |