| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730848fc69ca7afca2b3c3e10b6cfd92 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 |
| filingDate |
2007-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_926f6f1ed9db8696315c6bc2afdd0fca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efc773bd787d3c50f8c33548dc7a2419
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce7886d322f9b96d4cc03bc6b6b71623
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_258586470f7f6a304a246a44ab1225a7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfe25c9354f65b1f094b68db2fc948b4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9cfa284e07dda337bb27125e4456ad94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56ee2c37be67a377d8a3af0a8b0b58d8 |
| publicationDate |
2009-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2035518-A2 |
| titleOfInvention |
Antireflective coating compositions comprising siloxane polymer |
| abstract |
The present invention relates to a novel antireflective coating composition for forming an underlayer for a photoresist comprising an acid generator and a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1), where m is 0 or 1, W and W are independently a valence bond or a connecting group linking the cyclic ether to the silicon of the polymer and L is selected from hydrogen, W and W, or L and W are combined to comprise a cycloaliphatic linking group linking the cyclic ether to the silicon of the polymer. The invention also relates to a process for imaging the photoresist coated over the novel antireflective coating composition and provides good lithographic results. The invention further relates to a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1). |
| priorityDate |
2006-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |