| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8268e39ce70ff2ad19742e2a21d5a90c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3321 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02623
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-208
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-368
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-34 |
| filingDate |
2000-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60717440197f1cc5722fc0f8190c7d06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b73676e5037d9b589e414f7aaefe9b5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e3bde9cdc2bd0b4831ecc6ee3a5fb9b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9b26d7cd496e2cbbdb0a0c05317a11b |
| publicationDate |
2009-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2017369-A1 |
| titleOfInvention |
Chemical fluid deposition for the formation of metal and metal alloy films on patterned and unpatterned substrates |
| abstract |
A method of depositing a material onto a substrate is described, the method comprising: depositing a seed layer by i) dissolving a precursor of a seed material into a solvent to form a supercritical or near-supercritical solution, ii) exposing the substrate to the solution under conditions at which the precursor is stable in the solution, and iii) mixing a reaction reagent into the solution under conditions that initiate a chemical reaction involving the precursor, wherein the seed material is deposited as a seed layer onto the surface of the substrate when the substrate and the reaction reagent are in contact with the solution, while maintaining supercritical or near-supercritical conditions; and depositing a film on the seed layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102094183-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102094183-A |
| priorityDate |
1999-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |