| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89d074c8aa365efc764a50a8202c21a0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2998-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2998-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2003-247 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22C27-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76873
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22C5-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2855
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22C1-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22C27-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B15-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 |
| filingDate |
2007-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15de3319744fd94cc17b19497858d9f6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04f132717043326ac6fbb7dd135600f4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_598a27ba752180868b2ebe8d5a7f5ff7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba220897cc12d8cc3b93d59b6736c6a3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03b2397d93d220c11adf09287bf6756c |
| publicationDate |
2009-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2017362-A1 |
| titleOfInvention |
Brittle metall alloy sputtering targets and method of fabricating same |
| abstract |
A method of fabricating a sputtering target assembly comprises steps of mixing/blending selected amounts of powders of at least one noble or near-noble Group VIII metal at least one Group IVB, VB, or VIB refractory metal; forming the mixed/blended powder into a green compact having increased density; forming a full density compact from the green compact; cutting a target plate slice from the full density compact; diffusion bonding a backing plate to a surface of the target plate slice to form a target/backing plate assembly; and machining the target/backing plate assembly to a selected final dimension. The disclosed method is particularly useful for fabricating large diameter Ru-Ta alloy targets utilized in semiconductor metallization processing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015157421-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10023953-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9767999-B2 |
| priorityDate |
2007-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |